Description
We supply both 9800Hi and 9800Hm models!
- No mask which minimizes time and complexity
- Registration accuracy of 20μm for inner layers
- ±10μm annular ring accuracy
- Individual panel scaling to factor in distortion
- User feedback to improve results
- Partial scaling
- Seamless automation for ease-of-use and convenince
- Depth of Focus±300μm for challenging topography problems
- Rigid-flex single scan
- Traceability: Machine ID, scaling stamp, serial number stamp, date and time stamps
- High quality imaging with LDI and conventional resists
- UV range 355nm
- MAX substrate: 25″ x 32″ / 635 x 812mm
- MIN exposure: 24″ x 32″ / 609 x 812mm
- Substrate thickness: .001″ – .315″ / .025 – 8mm
- 8000 dpi, 2.5μm
- 160/132 throughput 8mJ/cm2 photoresist
- 125 throughput 50mJ/cm2 photoresist
- 16W